DocumentCode
2528594
Title
Degradation mechanism of Al-doped ZnO elements
Author
Zhiqing, Chen ; Hengkun, Xie
Author_Institution
Thermal Power Eng. Res. Inst., Xi´´an, China
fYear
1988
fDate
12-16 Sep 1988
Firstpage
113
Abstract
Accelerated life tests of Al-doped and undoped ZnO elements were carried out using a 50-Hz voltage, and the voltages at a current of 1 mA were measured at various temperatures. Measurements of I -V and C -V characteristics and microstructural analyses using scanning electron microscopy and energy dispersive X-ray analysis were performed. This investigation indicates that Al-doping increases the carrier density of ZnO grain, consequently decreasing the height of back-to-back Schottky barriers, resulting in premature degradation of ZnO elements. It is proposed that the degradation characteristics of ZnO elements can be improved by Ag doping and heat treatment
Keywords
II-VI semiconductors; X-ray chemical analysis; aluminium; life testing; scanning electron microscope examination of materials; zinc compounds; 1 mA; 50 Hz; C-V characteristics; EDAX; I-V characteristics; ZnO:Ag; ZnO:Al; accelerated life tests; back-to-back Schottky barriers; barrier heights; carrier density; degradation characteristics; degradation mechanism; energy dispersive X-ray analysis; heat treatment; microstructural analyses; premature degradation; scanning electron microscopy; semiconductors; temperatures; Current measurement; Degradation; Electrons; Energy measurement; Life estimation; Life testing; Performance analysis; Temperature measurement; Voltage; Zinc oxide;
fLanguage
English
Publisher
ieee
Conference_Titel
Properties and Applications of Dielectric Materials, 1988. Proceedings., Second International Conference on Properties and Applications of
Conference_Location
Beijing
Type
conf
DOI
10.1109/ICPADM.1988.38346
Filename
38346
Link To Document