• DocumentCode
    2529326
  • Title

    Polytype heterostructures for electron tunneling devices

  • Author

    Beresford, R. ; Luo, L.F. ; Longenbach, K. ; Wang, W.I.

  • Author_Institution
    Dept. of Electr. Eng., Columbia Univ., New York, NY, USA
  • fYear
    1989
  • fDate
    3-6 Dec. 1989
  • Firstpage
    547
  • Lastpage
    550
  • Abstract
    Polytype heterostructures of InAs-AlSb-GaSb exhibit interband tunneling due to the approximately 0.1-eV overlap of the InAs conduction band and the GaSb valence band. This broken-gap configuration results in a novel mechanism for negative differential resistance that has potential applications in high-speed devices. Nonresonant and resonant interband tunneling has been demonstrated, achieving peak-to-valley ratios at low temperature greater than 5:1 in single-barrier devices and greater than 60:1 in double-barrier devices. It is shown that distinct negative differential resistance characteristics can be obtained for thin (>
  • Keywords
    III-V semiconductors; aluminium compounds; equivalent circuits; gallium compounds; indium compounds; negative resistance; resonant tunnelling devices; semiconductor device models; semiconductor quantum wells; solid-state microwave devices; tunnelling; 200 GHz; EHF; GaSb valence band; InAs conduction band; InAs quantum wells; InAs-AlSb-GaSb; MM-wave devices; broken-gap configuration; current-voltage characteristics; double-barrier devices; electron tunneling devices; equivalent circuit model; high-speed devices; interband tunneling; millimetre wave operation; negative differential resistance; nonresonant tunnelling; peak-to-valley ratios; polytype heterostructures; resonant interband tunneling; resonant tunneling transistor; single-barrier devices; Conducting materials; Diodes; Doping; Electrons; Frequency; Gallium arsenide; Photonic band gap; Resonance; Resonant tunneling devices; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1989. IEDM '89. Technical Digest., International
  • Conference_Location
    Washington, DC, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-0817-4
  • Type

    conf

  • DOI
    10.1109/IEDM.1989.74341
  • Filename
    74341