DocumentCode
2530809
Title
Effect of fringing fields on subthreshold surface potential of channel engineered short channel MOSFETs
Author
Sarkar, Angsuman ; De, Swapnadip ; Nagarajan, Mohankumar ; Sarkar, C.K. ; Baishya, S.
Author_Institution
ECE Dept., Jalpaiguri Govt. Eng. Coll., Jalpaiguri
fYear
2008
fDate
19-21 Nov. 2008
Firstpage
1
Lastpage
6
Abstract
An analytical and accurate subthreshold surface potential model for short channel Conventional, LAC & double halo including the effect of inner fringing field is presented, considering the surface potential variation with the depth of the channel depletion layer. With this the drawback of existing models, the assumption of a constant channel depletion layer thickness is removed. A pseudo two dimensional method is adopted and we report a more accurate prediction of the surface potential including the fringing field effect.
Keywords
MOSFET; channel depletion layer; channel engineered short channel MOSFET; fringing field effect; pseudo two dimensional method; subthreshold surface potential; CMOS technology; Dielectric devices; Electrodes; Gaussian channels; Integrated circuit technology; Los Angeles Council; MOSFETs; Parasitic capacitance; Poisson equations; Postal services; Double Halo implant; Inner Fringing Field; LAC; Pseudo 2-D analysis; Surface Potential;
fLanguage
English
Publisher
ieee
Conference_Titel
TENCON 2008 - 2008 IEEE Region 10 Conference
Conference_Location
Hyderabad
Print_ISBN
978-1-4244-2408-5
Electronic_ISBN
978-1-4244-2409-2
Type
conf
DOI
10.1109/TENCON.2008.4766741
Filename
4766741
Link To Document