• DocumentCode
    2530809
  • Title

    Effect of fringing fields on subthreshold surface potential of channel engineered short channel MOSFETs

  • Author

    Sarkar, Angsuman ; De, Swapnadip ; Nagarajan, Mohankumar ; Sarkar, C.K. ; Baishya, S.

  • Author_Institution
    ECE Dept., Jalpaiguri Govt. Eng. Coll., Jalpaiguri
  • fYear
    2008
  • fDate
    19-21 Nov. 2008
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    An analytical and accurate subthreshold surface potential model for short channel Conventional, LAC & double halo including the effect of inner fringing field is presented, considering the surface potential variation with the depth of the channel depletion layer. With this the drawback of existing models, the assumption of a constant channel depletion layer thickness is removed. A pseudo two dimensional method is adopted and we report a more accurate prediction of the surface potential including the fringing field effect.
  • Keywords
    MOSFET; channel depletion layer; channel engineered short channel MOSFET; fringing field effect; pseudo two dimensional method; subthreshold surface potential; CMOS technology; Dielectric devices; Electrodes; Gaussian channels; Integrated circuit technology; Los Angeles Council; MOSFETs; Parasitic capacitance; Poisson equations; Postal services; Double Halo implant; Inner Fringing Field; LAC; Pseudo 2-D analysis; Surface Potential;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    TENCON 2008 - 2008 IEEE Region 10 Conference
  • Conference_Location
    Hyderabad
  • Print_ISBN
    978-1-4244-2408-5
  • Electronic_ISBN
    978-1-4244-2409-2
  • Type

    conf

  • DOI
    10.1109/TENCON.2008.4766741
  • Filename
    4766741