Micromachined array-type Mirau interferometer for MEMS metrology

Author

Gorecki, C. ; Bargiel, S. ; Albero, J. ; Passilly, N. ; Rousselot, C. ; Zeitner, U. ; Gastinger, K.

Author_Institution

Dept. MN2S, FEMTO-ST, Besançon, France

fYear

2011

fDate

5-9 June 2011

Firstpage

546

Lastpage

549

Abstract

This work presents the micromachined array-type Mirau interferometer, designed for massively parallel (5×5 channels) inspection of wafer-scale MEMS in the regime of a low coherence interferometry. The device is composed of vertically assembled glass wafers with batch-fabricated micro-optical components, i.e. refractive lenses, diffractive elements for correction of lens aberrations, micromirrors and multilayer dielectric beam-splitter. The fabrication processes of micro-optical components are described. The resolution measurement with USAF 1951 test pattern shows the capability of interferometer to distinguish lines down to 2.4 μm wide. The operation of interferometer demonstrator with the 700 × 700 μm² field of view is successfully demonstrated using commercially available MEMS IR sensor.

Keywords

light interferometers; micro-optics; microfabrication; microsensors; MEMS IR sensor; batch-fabricated microoptical component; diffractive elements; fabrication processes; lens aberrations; micro optical component; micromachined array-type mirau interferometer; micromirrors; multilayer dielectric beam-splitter; refractive lenses; size 2.4 mum; vertically assembled glass wafers; wafer-scale MEMS metrology; Glass; Lenses; Micromechanical devices; Micromirrors; Optical device fabrication; Optical interferometry; DOE; MEMS metrology; Mirau interferometer; beam-splitter; glass reflow; lenses; low-coherence interferometry;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Sensors, Actuators and Microsystems Conference (TRANSDUCERS), 2011 16th International

Conference_Location

Beijing

ISSN

Pending

Print_ISBN

978-1-4577-0157-3

Type

conf

DOI

10.1109/TRANSDUCERS.2011.5969709

Filename

5969709