• DocumentCode
    2540242
  • Title

    Theoretical study of plasma expansion and electrical characteristics in the high-current vacuum arc

  • Author

    Beilis, I.I. ; Keidar, M.

  • Author_Institution
    Fac. of Eng., Tel Aviv Univ., Israel
  • Volume
    1
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    206
  • Abstract
    The high-current vacuum arc plasma expansion is investigated using a two-dimensional model. The model considers the free boundary of the plasma jet, which is determined by a self-consistent solution of the gas-dynamic and electrical current equations. The electron temperature distribution is calculated from energy conservation. An influence of the starting condition at the cathode side (electron temperatures and directed velocity) on the interelectrode plasma parameter distribution is studied. It was found that the high current constriction leads to plasma compression, which accompanied by electron temperature grow. Plasma jet mixing leads to decrease of the directed plasma jet velocity that in turn affect potential distribution in the interelectrode gap
  • Keywords
    cathodes; energy conservation; plasma jets; plasma temperature; temperature distribution; vacuum arcs; cathode side; directed plasma jet velocity; directed velocity; electrical characteristics; electrical current equations; electron temperature distribution; electron temperature grow; electron temperatures; energy conservation; gas-dynamic equations; high current constriction; high-current vacuum arc; interelectrode gap; interelectrode plasma parameter distribution; plasma compression; plasma expansion; plasma jet free boundary; plasma jet mixing; starting condition; turn affect potential distribution; two-dimensional model; Anodes; Cathodes; Electric variables; Electrons; Equations; Magnetic fields; Plasma density; Plasma properties; Plasma temperature; Vacuum arcs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Discharges and Electrical Insulation in Vacuum, 2000. Proceedings. ISDEIV. XIXth International Symposium on
  • Conference_Location
    Xi´an
  • Print_ISBN
    0-7803-5791-4
  • Type

    conf

  • DOI
    10.1109/DEIV.2000.877286
  • Filename
    877286