• DocumentCode
    2554301
  • Title

    The dependence of GaN HEMT´s frequency figure of merit on temperature

  • Author

    Darwish, Ali M. ; Huebschman, Benjamin ; Viveiros, Edward ; Hung, H. Alfred

  • Author_Institution
    Army Res. Lab., Adelphi, MD, USA
  • fYear
    2009
  • fDate
    7-12 June 2009
  • Firstpage
    909
  • Lastpage
    912
  • Abstract
    This study presents extensive thermal characterization of GaN/SiC devices from five US sources across temperature (-25degC to +125degC). The changes with temperature for: cutoff frequency (ft), maximum oscillation frequency (fmax), saturated current (Idss), transconductance (gm) are measured, statistics studied, and correlations investigated. Temperature-coefficients are established for ft, fmax, Idss, and gm in GaN technology. The results obtained provide MMIC designers with key information required for meeting temperature specifications.
  • Keywords
    III-V semiconductors; MMIC; gallium compounds; high electron mobility transistors; integrated circuit design; semiconductor device measurement; silicon compounds; wide band gap semiconductors; GaN-SiC; HEMT frequency figure-of-merit; MMIC design; cutoff frequency; maximum oscillation frequency; saturated current; temperature -25 C to 125 C; temperature coefficients; thermal characterization; transconductance; Current measurement; Cutoff frequency; Decision support systems; Frequency measurement; Gallium nitride; HEMTs; Silicon carbide; Temperature dependence; Temperature distribution; Transconductance; Gallium nitride; MMIC; cutoff frequency; maximum oscillation frequency; saturated current; temperature coefficient; transconductance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Symposium Digest, 2009. MTT '09. IEEE MTT-S International
  • Conference_Location
    Boston, MA
  • ISSN
    0149-645X
  • Print_ISBN
    978-1-4244-2803-8
  • Electronic_ISBN
    0149-645X
  • Type

    conf

  • DOI
    10.1109/MWSYM.2009.5165845
  • Filename
    5165845