• DocumentCode
    255548
  • Title

    Threshold voltage modeling of GaN based normally-off tri-gate transistor

  • Author

    Yadav, C. ; Kushwaha, P. ; Agarwal, H. ; Chauhan, Y.S.

  • Author_Institution
    Dept. of Electr. Eng., Indian Inst. of Technol., Kanpur, Kanpur, India
  • fYear
    2014
  • fDate
    11-13 Dec. 2014
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    In this paper, a behavioral model of threshold voltage for normally-off (enhancement mode) AlGaN/GaN based tri-gate HEMT is proposed. AlGaN/GaN based tri-gate HEMT devices have additional sidewall gates and show threshold voltage variation with decreasing device width. The proposed model captures strain relaxation with reduction in device width, which is one of the primary reason for change in Vth in AlGaN/GaN tri-gate devices. Model shows excellent agreement with state-of-the-art experimental and simulation data.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor device models; wide band gap semiconductors; AlGaN-GaN; normally-off trigate transistor; threshold voltage modeling; tri-gate HEMT devices; Aluminum gallium nitride; DH-HEMTs; FinFETs; Gallium nitride;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    India Conference (INDICON), 2014 Annual IEEE
  • Conference_Location
    Pune
  • Print_ISBN
    978-1-4799-5362-2
  • Type

    conf

  • DOI
    10.1109/INDICON.2014.7030522
  • Filename
    7030522