• DocumentCode
    2558009
  • Title

    Recent investigations of SiGe/GaP thermoelectric materials at TTC and GE

  • Author

    Masters, R.G. ; Nakahara, J.F.

  • Author_Institution
    Thermo Electron Technol. Corp., Waltham, MA, USA
  • fYear
    1989
  • fDate
    6-11 Aug 1989
  • Firstpage
    706
  • Abstract
    The chemical, microstructural, and thermoelectric properties of improved and unimproved SiGe/GaP alloys are compared. High-temperature heat treatment of hot pressed SiGe/GaP materials is shown to produce an improved combination of thermoelectric properties. A large reduction in the electrical resistivity with only a slight decrease in the thermal conductivity is observed. A P/Ga ratio near 10 is also observed; however, additional work is required to verify if P/Ga ratio optimization is decisive in improving the material
  • Keywords
    Ge-Si alloys; gallium alloys; phosphorus alloys; semiconductor materials; thermoelectric conversion; GE; SiGe-GaP alloys; TTC; chemical properties; electrical resistivity; high temperature heat treatment; microstructural properties; ratio optimization; semiconductor; thermal conductivity; thermoelectric materials; Annealing; Composite materials; Germanium silicon alloys; Powders; Scanning electron microscopy; Silicon germanium; Solids; Space technology; Temperature; Thermoelectricity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Energy Conversion Engineering Conference, 1989. IECEC-89., Proceedings of the 24th Intersociety
  • Conference_Location
    Washington, DC
  • Type

    conf

  • DOI
    10.1109/IECEC.1989.74544
  • Filename
    74544