Fabrication of third order Bragg gratings by UV nanoimprint lithography for optofluidic lasers

Author

Peroz, C. ; Galas, J.C. ; Shi, J. ; LeGratiet, L. ; Chen, Y.

Author_Institution

Laboratoire de Photonique et de Nanostructures, CNRS, Marcoussis

fYear

0

fDate

0-0 0

Firstpage

62

Lastpage

63

Abstract

Soft UV nanoimprint lithography has be used to fabricate third order Bragg gratings for visible light and microfluidic dye laser operation. Soft stamps has been made by casting a poly-dimethylsiloxane on a silicon mould and a bi-layer imprinting process has used to obtain resist patterns of high density and high aspect ration line-and-space features. After a lift-off of thin nickel film, reactive ion etching was applied to transfer the patterned features into a glass substrate with aspect ratios up to 12. The integration of the fabricated Bragg gratings into a microfluidic chip allowed us to observe laser emission from a dye molecule (Rhodamine 6G) solution of very small volumes (30 to 75 pL), thereby providing a new method of making functioning optofluidic devices

Keywords

Bragg gratings; dye lasers; metallic thin films; microfluidics; nanolithography; nickel; optical fabrication; photoresists; soft lithography; sputter etching; Rhodamine 6G; bilayer imprinting; lift-off; microfluidic chip; optofluidic lasers; polydimethylsiloxane; reactive ion etching; resist patterns; soft UV nanoimprint lithography; thin nickel film; third order Bragg gratings; Bragg gratings; Casting; Etching; Glass; Microfluidics; Nanolithography; Nickel; Optical device fabrication; Resists; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

LEOS Summer Topical Meetings, 2006 Digest of the

Conference_Location

Quebec City, Que.

Print_ISBN

1-4244-0090-2

Type

conf

DOI

10.1109/LEOSST.2006.1693982

Filename

1693982