Unified framework for facility condition monitoring, detection, and diagnostics

Author

You, Huei-Shyang ; Wang, Tzu-Chi ; Chang, Wen-Yao ; Lai, Chih-Wei ; Lee, Ming-Wei ; Zuo, Kei-Wei

Author_Institution

Center for Environ., Safety & Health Technol. Dev., Ind. Technol. Res. Inst., Hsinchu, Taiwan

fYear

2004

fDate

9-10 Sept. 2004

Firstpage

41

Lastpage

46

Abstract

The advanced facility monitoring and diagnosis system provide a comprehensive solution to most of the possible problems in manufacturing. This article proposes an advanced facility monitoring and diagnosis system framework - APCSuite-ECMXpert, which consists of equipment condition monitoring system (ECMS), and advanced process control toolkit - APCSuite. The methodologies applied on facility condition monitoring and the application cases for monitoring the facility equipments in semiconductor plant are illustrated in This work.

Keywords

condition monitoring; process control; production engineering computing; production equipment; production facilities; semiconductor device manufacture; APCSuite-ECMXpert; advanced process control toolkit; equipment condition monitoring system; facility condition monitoring; facility detection; facility diagnosis system; semiconductor plant; Artificial neural networks; Condition monitoring; Flexible manufacturing systems; Humans; Manufacturing industries; Predictive maintenance; Production facilities; Pulse measurements; Semiconductor device manufacture; Vibration measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing Technology Workshop Proceedings, 2004

Print_ISBN

0-7803-8469-5

Type

conf

DOI

10.1109/SMTW.2004.1393712

Filename

1393712