Preparation of hard carbon films by microwave plasma torched under the open-air

In recent days, plasma phenomena and its process under atmospheric pressure (760 Torr) have been widely researched. The plasma process under atmospheric pressure is expected to be high speed in deposition and etching in spite of its controllability. If the process under atmospheric pressure realizes in the open-air, the processing system becomes simple and the controllability of substrates such as the processing area and the handling of substrates and the processing rate also becomes high in the open-air process. This enhances the availability of plasma process under atmospheric pressure. In this experiment, we deposited diamond and DLC (Diamond-like-Carbon) films by the plasma CVD process under entire open-air.