• DocumentCode
    2563348
  • Title

    Plasma filtration of vacuum arc droplets

  • Author

    Koval, N.N. ; Goncharenko, I.M. ; Langner, J. ; Grigoriev, S.V.

  • Volume
    2
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    590
  • Abstract
    Theoretical and experimental studies have been performed on the effect of the gas-discharge plasma on the vacuum arc droplet fraction arriving at the sample in plasma-assisted deposition of TiN coatings. It has been shown that the number of droplets on a negatively biased sample decreases four or five times if the droplet flow passes through the plasma of a low-pressure nonself-sustained arc discharge having a higher electron temperature than the plasma of the vacuum arc. Possible mechanisms for the observed plasma filtration of the droplet fraction of a vacuum arc are discussed
  • Keywords
    discharges (electric); drops; filtration; plasma CVD; plasma CVD coatings; plasma flow; plasma temperature; titanium compounds; vacuum deposited coatings; vacuum deposition; TiN; TiN coatings; droplet flow; electron temperature; gas-discharge plasma; low-pressure nonself-sustained arc discharge; negatively biased sample; plasma filtration; plasma-assisted deposition; vacuum arc droplet fraction; vacuum arc droplets; vacuum arc plasma; Cathodes; Coatings; Electrons; Filtration; Plasma devices; Plasma materials processing; Plasma properties; Plasma temperature; Tin; Vacuum arcs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Discharges and Electrical Insulation in Vacuum, 2000. Proceedings. ISDEIV. XIXth International Symposium on
  • Conference_Location
    Xi´an
  • Print_ISBN
    0-7803-5791-4
  • Type

    conf

  • DOI
    10.1109/DEIV.2000.879058
  • Filename
    879058