Crystallographic analysis of TiNi shape memory alloy thin film for microactuator

Author

Ikuta, Koji ; Fujita, Hiroyuki ; Ikeda, Michiaki ; Yamashita, Shinji

Author_Institution

Fac. of Eng., Tokyo Univ., Japan

fYear

1990

fDate

11-14 Feb 1990

Firstpage

38

Lastpage

39

Abstract

Basic research for the micro actuator using TiNi shape-memory alloy (SMA) is conducted from the crystallographic point of view. SMA (TiNi) thin film is fabricated by sputtering deposition. The influence of substrate temperature on crystal structure is verified by measuring resistivity-temperature characteristics and X-ray diffraction. Sputtered TiNi thin film under a low-temperature substrate condition showed amorphous structure. However, thin film sputtered at a high-temperature condition had a crystal lattice, and showed similar phase transformation characteristics as regular bulk TiNi. The results of applying electric current into amorphous TiNi film show that though annealing can encourage crystallization, it is not sufficient

Keywords

X-ray diffraction examination of materials; crystallisation; electric actuators; nickel alloys; shape memory effects; sputtered coatings; titanium alloys; Ti-Ni; X-ray diffraction; amorphous structure; annealing; crystal lattice; crystallographic analysis; microactuator; phase transformation characteristics; resistivity-temperature characteristics; shape-memory alloy; sputtered coatings; sputtering deposition; Amorphous materials; Crystallization; Crystallography; Microactuators; Shape memory alloys; Sputtering; Substrates; Temperature; Transistors; X-ray diffraction;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro Electro Mechanical Systems, 1990. Proceedings, An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots. IEEE

Conference_Location

Napa Valley, CA

Type

conf

DOI

10.1109/MEMSYS.1990.110243

Filename

110243