DocumentCode
2571892
Title
Development of 4×4 MEMS optical switch
Author
Kato, Yoshichika ; Mori, Keiichi ; Mase, Takao ; Takahashi, Ayumi ; Imaki, Osamu ; Kaku, Ryoji
Author_Institution
Central Res. Lab., Japan Aviation Electron. Ind. Ltd., Tokyo, Japan
fYear
2000
fDate
2000
Firstpage
95
Lastpage
96
Abstract
We present a design and experimental results of a 4×4 matrix optical switch that is suitable for passive alignment process, in which thick photoresist technology is utilized for the fabrication of tall vertical mirrors
Keywords
etching; micro-optics; micromachining; mirrors; optical communication equipment; optical fabrication; optical switches; photoresists; MEMS optical switch; etching; fabrication; matrix optical switch; micromachined switch; micromirrors; passive alignment process; photolithography; tall vertical mirrors; thick photoresist technology; Fasteners; Micromechanical devices; Mirrors; Optical coupling; Optical design; Optical device fabrication; Optical fibers; Optical losses; Optical switches; Resists;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical MEMS, 2000 IEEE/LEOS International Conference on
Conference_Location
Kauai, HI
Print_ISBN
0-7803-6257-8
Type
conf
DOI
10.1109/OMEMS.2000.879643
Filename
879643
Link To Document