DocumentCode
2572376
Title
A watermarking technique for hard IP protection in post-layout design level
Author
Cai, Xueyu ; Gao, Zhiqiang ; Bai, Fujun ; Xu, Yi
Author_Institution
Tsinghua Univ., Beijing
fYear
2007
fDate
22-25 Oct. 2007
Firstpage
1317
Lastpage
1320
Abstract
The intellectual property (IP)-reuse-based SOC design methodology has become the mainstream. However malice modification of IP is badly infringing the expansion of legal IP- trade. Consequently the IP copyright protection becomes very sensitive and urgent. Among all kinds of IP protection (IPP) techniques, the watermarking is one of the most developed and promising approaches. In this paper we introduce a new watermarking technique for hard IP protection by embedding additional design constraints in post-physical layout design level. It can be applied to both VLSI designs and full-custom designs. In this paper, we focus on the application of this IPP approach in full-custom ones. The principle and a watermarking implementation system are proposed, and the experimental results are reported.
Keywords
VLSI; copyright; industrial property; integrated circuit layout; system-on-chip; watermarking; SOC design methodology; VLSI designs; copyright protection; full-custom designs; intellectual property; post-layout design level; watermarking technique; Copyright protection; Design methodology; Law; Legal factors; Microelectronics; Process design; Scattering; Time to market; Very large scale integration; Watermarking;
fLanguage
English
Publisher
ieee
Conference_Titel
ASIC, 2007. ASICON '07. 7th International Conference on
Conference_Location
Guilin
Print_ISBN
978-1-4244-1132-0
Electronic_ISBN
978-1-4244-1132-0
Type
conf
DOI
10.1109/ICASIC.2007.4415879
Filename
4415879
Link To Document