• DocumentCode
    2577640
  • Title

    Modeling and enacting software processes: an analysis

  • Author

    Lonchamp, J. ; Benali, K. ; Godart, C. ; Derniame, J.C.

  • Author_Institution
    CRIN, Vandoeuvre les Nancy, France
  • fYear
    1990
  • fDate
    31 Oct-2 Nov 1990
  • Firstpage
    727
  • Lastpage
    736
  • Abstract
    Previous studies have led to a better understanding of the nature, the characteristics, and the implications of software process modeling and enacting. The authors attempt to reap the benefits of this better understanding, through an analysis of what should be a complete assisted development, in order to deduce a rich set of requirements and facilities for software process modeling and enacting, and to highlight and discuss some essential issues for the improvement of present proposals in the field of model driven IPSEs (integrated project support environments). Three well-known prototypes of assisted environments are examined: TRIAD/CML for the imperative approach, Marvel for the rule-based approach, and IPSE 2.5 for the object-oriented approach. Finally, the authors emphasize essential issues for future third-generation IPSEs: these new IPSEs must be real IPSEs, they must provide multiform assistance and cope with different kinds of processes including complex ones, and they must take into account dynamic evolution of software process models
  • Keywords
    knowledge based systems; object-oriented programming; programming environments; project support environments; IPSE 2.5; Marvel; TRIAD/CML; integrated project support environments; model driven IPSEs; object-oriented approach; rule-based approach; software process enacting; software process modeling; Automatic control; Humans; Object oriented modeling; Productivity; Proposals; Scanning probe microscopy; Software maintenance; Software quality;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Computer Software and Applications Conference, 1990. COMPSAC 90. Proceedings., Fourteenth Annual International
  • Conference_Location
    Chicago, IL
  • Print_ISBN
    0-8186-2054-4
  • Type

    conf

  • DOI
    10.1109/CMPSAC.1990.139469
  • Filename
    139469