• DocumentCode
    2578432
  • Title

    InGaN light-emitting diodes with the strained AlGaN/InGaN multiple quantum barriers

  • Author

    Tsai, Chia-Lung ; Liu, Guan-Shan ; Lin, Jia-Qing ; Tseng, Hung-Wei ; Wang, Chien-Yu

  • Author_Institution
    Dept. of Electron. Eng., Chang Gung Univ., Taoyuan, Taiwan
  • fYear
    2009
  • fDate
    2-5 June 2009
  • Firstpage
    115
  • Lastpage
    117
  • Abstract
    In this article, we propose to use the strained Al0.03Ga0.97N/In0.01Ga0.99N superlattice as the quantum barrier of the InGaN LEDs. The advantage of doing this could be thought of relieving the biaxial strain for the normal InGaN/AlGaN MQWs, and improving the crystalline quality. Experimentally, high-resolution X-ray diffraction (HRXRD) was used to clarify the structural properties of the as-grown samples. As a result, the crystalline quality of the proposed LEDs does not degrade even incorporated an AlGaN into the barrier layer. For the LEDs with a strained-layer superlattice (SLS) quantum barrier, the observed PL intensity at 300 K becomes intense together with a blue shift of the emission peak that may be attributed to the alleviation of quantum-confined Stark effect (QCSE) as evaluated from the biased PL analysis.
  • Keywords
    X-ray diffraction; aluminium compounds; gallium compounds; indium compounds; light emitting diodes; photoluminescence; quantum confined Stark effect; semiconductor superlattices; spectral line shift; Al0.03Ga0.97N-In0.01Ga0.99N; blue shift; high-resolution X-ray diffraction; light-emitting diodes; multiple quantum barriers; quantum-confined Stark effect; strained-layer superlattice; Aluminum gallium nitride; Capacitive sensors; Crystallization; Degradation; Laser sintering; Light emitting diodes; Quantum well devices; Stark effect; Superlattices; X-ray diffraction; InGaN; Light emitting diodes (LEDs); QCSE; Quantum barriers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology Materials and Devices Conference, 2009. NMDC '09. IEEE
  • Conference_Location
    Traverse City, MI
  • Print_ISBN
    978-1-4244-4695-7
  • Electronic_ISBN
    978-1-4244-4696-4
  • Type

    conf

  • DOI
    10.1109/NMDC.2009.5167537
  • Filename
    5167537