• DocumentCode
    2580629
  • Title

    Patterning of self-assembled nanoparticles by electron-beam lithography with chemically amplified resists

  • Author

    Kuo, C.I. ; Chen, H.L. ; Chu, Y.H. ; Liu, F.K. ; Ko, F.H. ; Chu, T.C.

  • Author_Institution
    Nat. Nano Device Lab., Hsinchu, Taiwan
  • fYear
    2003
  • fDate
    29-31 Oct. 2003
  • Firstpage
    224
  • Lastpage
    225
  • Abstract
    In this paper, patterning of self-assembled nanoparticles by using a shaped electron-beam exposure system with commercial chemically amplified resists (CAR) was demonstrated.
  • Keywords
    electron beam lithography; gold; nanolithography; nanoparticles; particle size; self-assembly; Au; chemically amplified resists; electron-beam exposure system; electron-beam lithography; particle size; self assembled nanoparticles patterning; Biological materials; Chemicals; Electron beams; Gold; Lithography; Magnetic materials; Nanoparticles; Optical materials; Resists; Self-assembly;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-040-2
  • Type

    conf

  • DOI
    10.1109/IMNC.2003.1268724
  • Filename
    1268724
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2580629