DocumentCode
2581121
Title
Progress of a laser-produced-plasma light source for EUV lithography
Author
Komori, H. ; Abe, T. ; Suganuma, T. ; Imai, Y. ; Someya, H. ; Hoshino, H. ; Nakano, M. ; Soumagne, G. ; Takabayashi, Y. ; Mizoguchi, H. ; Endo, A. ; Toyoda, K. ; Horiike, Y.
Author_Institution
Hiratsuka Res. Center, Extreme Ultraviolet Lithography Syst. Dev. Assoc., Kanagawa, Japan
fYear
2003
fDate
29-31 Oct. 2003
Firstpage
276
Abstract
Summary form only given. Extreme Ultraviolet Lithography (EUVL) is a major candidate of next generation lithography (NGL) technology for the fabrication of 45 nm node and below. In this paper, we report the laser produced plasma EUV light source development status.
Keywords
plasma production by laser; plasma sources; ultraviolet lithography; ultraviolet sources; 45 nm; EUV lithography; extreme ultraviolet lithography; laser-produced-plasma light source; Light sources; Lithography; Optical pulses; Oscillators; Power generation; Power lasers; Space vector pulse width modulation; Ultraviolet sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-040-2
Type
conf
DOI
10.1109/IMNC.2003.1268753
Filename
1268753
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