DocumentCode
2581231
Title
Double gratings lateral shearing interferometer for EUVL
Author
Liu, Z.Q. ; Zhu, Y. ; Sugisaki, K. ; Ishii, M. ; Murakami, K. ; Saito, J. ; Suzuki, A. ; Hasegawa, M.
Author_Institution
Wave Front Meas. Lab., Extreme Ultraviolet Lithography Syst. Dev. Assoc., Sagamihara, Japan
fYear
2003
fDate
29-31 Oct. 2003
Firstpage
290
Lastpage
291
Abstract
At wavelength measurement is important for EUVL PO (Extreme Ultraviolet Lithograph Project Optics). Because the wavelength of EUVL is very short, it is difficult to use normal interferometers for this. We suggest a DLSI (Double grating lateral shearing interferometer) in which the influence of the light source can be canceled. Moreover, in DLSI, the interferogram is one-color.
Keywords
diffraction gratings; light interferometers; masks; ultraviolet lithography; double gratings lateral shearing interferometer; fringe scanning; one-color interferogram; ultraviolet lithography; Charge coupled devices; Diffraction; Gratings; Interferometric lithography; Large scale integration; Light sources; Optical interferometry; Shearing; Ultraviolet sources; Wavelength measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-040-2
Type
conf
DOI
10.1109/IMNC.2003.1268760
Filename
1268760
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