DocumentCode
2581412
Title
Laser plasma light source based on a gas puff target for EUV metrology applications
Author
Fiedorowicz, H. ; Bartnik, A. ; Jarocki, R. ; Kostecki, J. ; Mikolajczyk, J. ; Rakowski, R. ; Szczurek, M.
Author_Institution
Inst. of Optoelectron., Mil. Univ. of Technol., Warszawa, Poland
fYear
2003
fDate
29-31 Oct. 2003
Firstpage
314
Abstract
Summary form only given. In this paper a newly developed compact EUV source is presented. The source is based on the double-stream gas puff target. Using the double-stream gas puff target approach a compact low-power laser plasma light source for metrology of optics, masks and resists for EUV lithography technologies has been developed.
Keywords
plasma sources; ultraviolet lithography; ultraviolet sources; EUV source metrology; double-stream gas puff target; extreme UV source; laser plasma light source; masks; optics; resists; ultraviolet lithography; Gas lasers; Gratings; Light sources; Metrology; Plasma applications; Plasma sources; Solid lasers; Ultraviolet sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-040-2
Type
conf
DOI
10.1109/IMNC.2003.1268772
Filename
1268772
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