DocumentCode
2581644
Title
Simulation of polymer deformation for various shaped patterns in thermal nano imprint lithography
Author
Hirai, Y. ; Yoshida, S. ; Konishi, T.
Author_Institution
Mech. Syst. Eng., Osaka Prefecture Univ., Sakai, Japan
fYear
2003
fDate
29-31 Oct. 2003
Firstpage
344
Lastpage
345
Abstract
In this paper, we review the resist deformation process for various aspect ratio and duty ratio in variation with the initial resist polymer thickness by numerical simulation and experiment.
Keywords
deformation; nanolithography; numerical analysis; polymers; resists; numerical simulation; polymer resist deformation; thermal nano imprint lithography; Deformable models; Fabrication; Lithography; Mechanical systems; Polymers; Pressing; Resists; Rubber; Systems engineering and theory; Thermal engineering;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-040-2
Type
conf
DOI
10.1109/IMNC.2003.1268787
Filename
1268787
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