Integration Of Ultra-low-k Xerogel Gapfill Dielectric For high Performance Sub-o.18 /spl mu/m Interconnects

Author

List, R.S. ; Jin, C. ; Russell, S.W. ; Yamanaka, S. ; Olsen, L. ; Le, L. ; Ting, L.M. ; Havemann, R.H.

Author_Institution

Semiconductor Process and Device Center, Texas Instruments, PO Box 655012, MS 457, Dallas, Texas 75265

fYear

1997

fDate

10-12 June 1997

Firstpage

Lastpage

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on

Print_ISBN

4-930813-75-1

Type

DOI

10.1109/VLSIT.1997.623703

Filename

623703

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