DocumentCode

2589523

Title

Charging And Intrinsic-leakage Current Peaks In Thin Silicon-dioxide Films

Author

Yamada, R. ; Yugami, J. ; Ohkura, M.

Author_Institution

Central Research Laboratory, Hitachi, Ltd. Kokubunji, Tokyo 185, Japan

fYear

1997

fDate

10-12 June 1997

Firstpage

147

Lastpage

148

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on

Print_ISBN

4-930813-75-1

Type

conf

DOI

10.1109/VLSIT.1997.623741

Filename

623741