Use of process simulators to assist in the design of processes for manufacturability

Author

Kump, Michael R. ; Mylroie, S.W. ; Alexander, W.J.C. ; Walton, A.J.

Author_Institution

Technol. Modeling Associates, Palo Alto, CA, USA

fYear

1990

fDate

11-12 Sep 1990

Firstpage

15

Lastpage

21

Abstract

It is shown how semiconductor process simulation. by replacing numerous runsplits, can be a cost-effective way to design technologies for both optimal performance and manufacturability. The use of process and device simulators for designing for manufacturability is illustrated by considering two examples both drawn from experiences in semiconductor manufacturing. The first is the design of a high-sheet-resistivity implanted resistor to minimize its variability. The second is the design of certain aspects of a lightly doped drain (LDD) MOS process both to optimize the intrinsic device performance and to improve its manufacturability

Keywords

digital simulation; electronic engineering computing; integrated circuit manufacture; semiconductor device manufacture; LDD MOS process; high-sheet-resistivity; implanted resistor; lightly doped drain; manufacturability; semiconductor manufacturing; semiconductor process simulation; Conductivity; Costs; Design for manufacture; Energy consumption; Manufacturing processes; Process design; Random processes; Resistors; Semiconductor device manufacture; Virtual manufacturing;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Semiconductor Manufacturing Conference and Workshop, 1990. ASMC 90 Proceedings. IEEE/SEMI 1990

Conference_Location

Danvers, MA

Type

conf

DOI

10.1109/ASMC.1990.111214

Filename

111214