Hub-centered production control of wafer fabrication

Author

Lou, Sheldon ; Yan, Houmin ; Sethi, Suresh ; Gardel, Anne ; Deosthali, Prabhat

Author_Institution

Fac. of Manage., Toronto Univ., Ont., Canada

fYear

1990

fDate

11-12 Sep 1990

Firstpage

27

Lastpage

32

Abstract

A flow-rate control policy to manage the production of a wafer fabrication facility is described. The policy is derived by formulating and solving a stochastic control problem. The results are then used to develop two sets of production control rules. The first one adjusts the lot release by determining when and how many new lots should be started. The second one controls the reentrant process in the photolithography area, commonly known as the hub. The control rules are robust against random disturbances because they provide a feedback control based on the information of the entire shop floor

Keywords

feedback; integrated circuit manufacture; production control; semiconductor device manufacture; feedback control; flow-rate control policy; hub-centred production control; photolithography area; reentrant process; shop floor information; stochastic control problem; wafer fabrication facility; Cellular manufacturing; Dispatching; Electric breakdown; Fabrication; Feedback control; Job shop scheduling; Lithography; Production control; Semiconductor device manufacture; Semiconductor device modeling;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Semiconductor Manufacturing Conference and Workshop, 1990. ASMC 90 Proceedings. IEEE/SEMI 1990

Conference_Location

Danvers, MA

Type

conf

DOI

10.1109/ASMC.1990.111216

Filename

111216