• DocumentCode
    2591631
  • Title

    Thermal analysis of ultra-thin body device scaling [SOI and FinFet devices]

  • Author

    Pop, E. ; Dutton, R. ; Goodson, K.

  • Author_Institution
    Dept. of Electr. Eng., Stanford Univ., CA, USA
  • fYear
    2003
  • fDate
    8-10 Dec. 2003
  • Abstract
    This paper explores the effect of confined dimensions and complicated geometries on the self-heating of ultra-thin body SOI and FinFET devices. A compact thermal model is introduced, incorporating the most advanced understanding of nanoscale heat conduction available. Novel device scaling is analyzed from a thermal point of view. We show device temperatures are very sensitive to the choice of drain and channel extension dimensions, and suggest a parameter design space which can help alleviate thermal problems. ITRS power guidelines below the 25 nm technology node should be revised if isothermal scaling of thin-body devices is desired.
  • Keywords
    MOSFET; heat conduction; semiconductor device models; silicon-on-insulator; thermal analysis; 25 nm; FinFET; SOI; UTB silicon-on-insulator devices; channel extension dimensions; compact thermal model; confined dimensions; drain extension dimensions; isothermal scaling; nanoscale heat conduction; self-heating; thermal analysis; ultra-thin body device scaling; Conductive films; FinFETs; Impurities; Phonons; Scattering; Semiconductor films; Silicon on insulator technology; Space technology; Thermal conductivity; Thermal resistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2003. IEDM '03 Technical Digest. IEEE International
  • Conference_Location
    Washington, DC, USA
  • Print_ISBN
    0-7803-7872-5
  • Type

    conf

  • DOI
    10.1109/IEDM.2003.1269420
  • Filename
    1269420