DocumentCode
2600261
Title
Degradation of Mis Devices Under Electron Bombardment
Author
Zaininger, K H
Author_Institution
RCA Laboratories, Princeton, N. J.
fYear
1966
fDate
Nov. 1966
Firstpage
328
Lastpage
348
Abstract
The behavior and physics of failure of MIS devices under irradiation with energetic electrons was investigated. It was found that the bombardment usually results in the introduction of positive charge in the insulator. This effect is explained by a physical model which involves interaction of secondary electrons with the insulator lattice to generate electron-hole pairs and predominant trapping of holes in the insulator. The dependence of the radiation sensitivity on pre-bombardment surface state density, device parameters, and fabrication procedure, as well as the annealing behavior was studied.
Keywords
Degradation; Electrons; Hafnium; Indium tin oxide; MIS devices;
fLanguage
English
Publisher
ieee
Conference_Titel
Physics of Failure in Electronics, 1966. Fifth Annual Symposium on the
Conference_Location
Columbus, OH, USA
ISSN
0097-2088
Type
conf
DOI
10.1109/IRPS.1966.362370
Filename
4207730
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