• DocumentCode
    2600261
  • Title

    Degradation of Mis Devices Under Electron Bombardment

  • Author

    Zaininger, K H

  • Author_Institution
    RCA Laboratories, Princeton, N. J.
  • fYear
    1966
  • fDate
    Nov. 1966
  • Firstpage
    328
  • Lastpage
    348
  • Abstract
    The behavior and physics of failure of MIS devices under irradiation with energetic electrons was investigated. It was found that the bombardment usually results in the introduction of positive charge in the insulator. This effect is explained by a physical model which involves interaction of secondary electrons with the insulator lattice to generate electron-hole pairs and predominant trapping of holes in the insulator. The dependence of the radiation sensitivity on pre-bombardment surface state density, device parameters, and fabrication procedure, as well as the annealing behavior was studied.
  • Keywords
    Degradation; Electrons; Hafnium; Indium tin oxide; MIS devices;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Physics of Failure in Electronics, 1966. Fifth Annual Symposium on the
  • Conference_Location
    Columbus, OH, USA
  • ISSN
    0097-2088
  • Type

    conf

  • DOI
    10.1109/IRPS.1966.362370
  • Filename
    4207730