• DocumentCode
    2609955
  • Title

    High-speed short cavity strained-layer multiple quantum well lasers

  • Author

    Lester, L.F. ; Schaff, W.J. ; Song, X. ; Offsey, S.D. ; Eastman, L.F.

  • Author_Institution
    Sch. of Electr. Eng., Cornell Univ., Ithaca, NY, USA
  • fYear
    1991
  • fDate
    5-7 Aug 1991
  • Firstpage
    229
  • Lastpage
    237
  • Abstract
    The high-speed response and optical properties of strained-layer In0.3Ga0.7As four and five quantum-well ridge waveguide lasers fabricated by chemically-assisted ion beam etching (CAIBE) are presented. The threshold current variation with cavity length is very similar for the two-layer designs, but the differential gain decreases more quickly with optical loss in the four quantum-well devices. Consequently, whereas the 200-400 μm cavity length lasers from the four quantum-well wafer are superior to those from the five quantum-well layer in terms of high speed performance, the 50- and 100-μm long devices are nearly identical. A CW 3-dB bandwidth of 22 GHz and a record 3-dB bandwidth of 26 GHz under pulsed bias have been measured on 50μm long lasers. 100-μm cavity length lasers exhibit excellent modulation efficiency with a typical 3-dB bandwidth of 20 GHz
  • Keywords
    laser cavity resonators; optical losses; optical modulation; optical waveguides; semiconductor junction lasers; 20 GHz; 22 GHz; 26 GHz; 50 to 400 micron; CAIBE; CW 3-dB bandwidth; In0.3Ga0.7As; MQW lasers; cavity length; chemically-assisted ion beam etching; differential gain; high-speed response; modulation efficiency; multiple quantum well lasers; optical loss; optical properties; pulsed bias; ridge waveguide lasers; semiconductor lasers; short cavity; strained-layer; threshold current variation; Bandwidth; Chemical lasers; High speed optical techniques; Ion beams; Optical waveguides; Particle beam optics; Pulse measurements; Pulse modulation; Quantum well lasers; Waveguide lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    High Speed Semiconductor Devices and Circuits, 1991., Proceedings IEEE/Cornell Conference on Advanced Concepts in
  • Conference_Location
    Ithaca, NY
  • Print_ISBN
    0-7803-0491-8
  • Type

    conf

  • DOI
    10.1109/CORNEL.1991.169990
  • Filename
    169990