DocumentCode
2609997
Title
Passivated emitters in silicon solar cells
Author
King, Richard ; Gruenbaum, Peter ; Sinton, Ronald ; Swanson, Richard
Author_Institution
Dept. of Electr. Eng., Stanford Univ., CA, USA
fYear
1990
fDate
21-25 May 1990
Firstpage
227
Abstract
In high-efficiency silicon solar cells with low metal contact coverage fractions and high bulk lifetimes, cell performance is often dominated by recombination in the oxide-passivated diffusions on the cell surface. Measurements of the emitter saturation current density, J o, of oxide-passivated, boron and phosphorus diffusions are presented, and from these measurements, the dependence of surface recombination velocity on dopant concentration is extracted. The lowest observed values of J o which are stable under UV light are given for both boron- and phosphorus-doped, oxide-passivated diffusions, for both textured and untextured surfaces. Contour plots which incorporate the above data were applied to two types of backside-contact solar cells with large area (37.5 cm2) and one-sun efficiencies up to 22.7%
Keywords
electron-hole recombination; elemental semiconductors; passivation; silicon; solar cells; Si solar cells; Si:B solar cell; Si:P solar cell; bulk lifetimes; contour plots; emitter saturation current density; metal contact coverage fractions; oxide-passivated diffusions; performance; surface recombination velocity; Boron; Current density; Current measurement; Data mining; Density measurement; Oxidation; Photovoltaic cells; Silicon; Velocity measurement; Wavelength measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 1990., Conference Record of the Twenty First IEEE
Conference_Location
Kissimmee, FL
Type
conf
DOI
10.1109/PVSC.1990.111622
Filename
111622
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