DocumentCode
2612051
Title
Molecular dynamics simulation on LO phonon mode decay in Si nano-structure covered with oxide films
Author
Zushi, T. ; Ohdomari, I. ; Watanabe, T. ; Kamakura, Y. ; Taniguchi, K.
Author_Institution
Fac. of Sci. & Eng., Waseda Univ., Tokyo, Japan
fYear
2010
fDate
6-8 Sept. 2010
Firstpage
73
Lastpage
76
Abstract
A series of molecular dynamics (MD) simulations is conducted to investigate the dynamics of longitudinal optical (LO) phonon in Si nano-structure confined with oxide films. This work is motivated by heat issues in nanoscopic devices; it is considered that the LO phonons with low group velocity are accumulated in the nanoscopic device and the electric property deteriorates. We estimate the relaxation time of the LO phonon and investigate its dependency on the oxide thickness. The calculation results show that the LO phonon decays faster as the oxide thickness increases and turns into acoustic phonon. The result indicates that the presence of SiO2 films promotes the scattering of the phonon and this is effective to diminish the optical phonon.
Keywords
elemental semiconductors; molecular dynamics method; nanostructured materials; phonons; silicon; silicon compounds; Si-SiO2; acoustic phonon; electric property; group velocity; longitudinal optical phonon dynamics; longitudinal optical phonon mode decay; molecular dynamics simulation; nanoscopic devices; oxide films; oxide thickness; phonon scattering; relaxation time; silica films; silicon nanostructure; Acoustics; Films; Heating; Lattices; Nanoscale devices; Phonons; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices (SISPAD), 2010 International Conference on
Conference_Location
Bologna
ISSN
1946-1569
Print_ISBN
978-1-4244-7701-2
Electronic_ISBN
1946-1569
Type
conf
DOI
10.1109/SISPAD.2010.5604568
Filename
5604568
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