• DocumentCode
    2614854
  • Title

    Degradation and recovery of SiGe HBTs following radiation and hot-carrier stressing

  • Author

    Sheng, S.R. ; McAlister, S.P. ; McCaffrey, J.P. ; Kovacic, S.

  • Author_Institution
    Inst. for Microstruct. Sci., Ottawa, Ont., Canada
  • fYear
    2003
  • fDate
    10-12 Dec. 2003
  • Firstpage
    14
  • Lastpage
    15
  • Abstract
    Device degradation can arise though a variety of stress conditions and mechanisms. Here we focus on SiGe HBTs and effects of γ-radiation and hot-carrier stress on the DC devices characteristics, and subsequent annealing following the stress. Hot-carriers electrical stressing was performed at room temperature by applying a constant reverse-bias voltage across the BE junction, with the collector and substrate open. The radiation and hot-carrier induced changes were followed in time during annealing at room and elevated temperature.
  • Keywords
    Ge-Si alloys; annealing; gamma-ray effects; heterojunction bipolar transistors; hot carriers; recovery; semiconductor materials; γ-radiation effects; 293 to 298 K; SiGe; SiGe HBTs; annealing; degradation; device degradation; electrical stressing; hot-carrier stressing; recovery; room temperature; Annealing; Degradation; Diodes; Germanium silicon alloys; Heterojunction bipolar transistors; Hot carriers; Silicon germanium; Substrates; Temperature; Thermal stresses;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2003 International
  • Print_ISBN
    0-7803-8139-4
  • Type

    conf

  • DOI
    10.1109/ISDRS.2003.1271973
  • Filename
    1271973