DocumentCode
2617898
Title
Contacts to group III nitride semiconductor alloys
Author
Mohney, S.E. ; Hull, B.A. ; Wang, J.H.
Author_Institution
Dept. of Mater. Sci. & Eng., Pennsylvania State Univ., University Park, PA, USA
fYear
2003
fDate
10-12 Dec. 2003
Firstpage
400
Abstract
In group III nitride semiconductor alloys, such as AlxGa1-xN, most contacts are very similar to those for GaN. In this presentation, we have explored a special consideration of the contact metallurgy alloy semiconductors and how interfacial reactions with metals can lead to compositional shifts in the semiconductor alloys beneath the contacts. High temperature annealing of the late transition Ni and Pd on AlxGa1-xN leads to compositional shift in the semiconductor immediately beneath the contact metal, as determined by X-ray photoelectron spectroscopy and scanning transmission electron microscopy. It has also been reported that a significant reduction in the resistance of ohmic contacts to n-type AlxGa1-xN with x>0.4 takes place using a contact metallurgy. In addition to describing these contacts, we offer a possible explanation for the advantage of using V-based contacts, developed by considering the metallurgy of contacts to the AlxGa1-xN semiconductor alloy.
Keywords
III-V semiconductors; X-ray photoelectron spectra; aluminium compounds; annealing; gallium compounds; ohmic contacts; scanning electron microscopy; wide band gap semiconductors; AlxGa1-xN; AlxGa1-xN semiconductor alloy; V-based contacts; X-ray photoelectron spectroscopy; annealing; contact metallurgy; ohmic contacts; scanning transmission electron microscopy; Annealing; Contact resistance; Gallium nitride; Lead compounds; Photoelectron microscopy; Scanning electron microscopy; Semiconductor materials; Spectroscopy; Temperature; Transmission electron microscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Device Research Symposium, 2003 International
Print_ISBN
0-7803-8139-4
Type
conf
DOI
10.1109/ISDRS.2003.1272153
Filename
1272153
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