Creation of adhesion resistant silica glass surfaces with ultraviolet laser cleaning

Author

Hafpenny, D.R. ; Kane, D.M. ; Lamb, R.N. ; Gong, B.

Author_Institution

Sch. of Math., Phys. Comput. & Electron., Macquarie Univ., North Ryde, NSW, Australia

fYear

1996

fDate

8-11 Dec 1996

Firstpage

470

Lastpage

473

Abstract

By using the ultraviolet irradiation from a frequency doubled copper vapour laser, in the fluence range used for laser cleaning, the surface chemistry of silica can be modified. Analysis has shown that the surface is dehydroxylated by the UV light changing it from hydrophilic to hydrophobic in nature. The modification of the surface has the effect of reducing the number of particles that adhere to the treated surface by up to 80%, for 0.3 μm diameter particles, upon subsequent contamination of the surface

Keywords

adhesion; glass; laser materials processing; silicon compounds; surface chemistry; surface cleaning; surface contamination; 0.3 mum; SiO₂; adhesion resistant silica glass surfaces; fluence range; frequency doubled Cu vapour laser; hydrophilic surface; hydrophobic surface; surface chemistry; surface contamination; surface dehydroxylation; ultraviolet irradiation; ultraviolet laser cleaning; Adhesives; Chemical lasers; Cleaning; Copper; Frequency; Glass; Silicon compounds; Surface contamination; Surface emitting lasers; Surface treatment;

fLanguage

English

Publisher

ieee

Conference_Titel

Optoelectronic and Microelectronic Materials And Devices Proceedings, 1996 Conference on

Conference_Location

Canberra, ACT

Print_ISBN

0-7803-3374-8

Type

conf

DOI

10.1109/COMMAD.1996.610168

Filename

610168