• DocumentCode
    2629516
  • Title

    Mechanical properties of in-situ doped polycrystalline 3C-SiC thin films

  • Author

    Jeong, Jae-Min ; Lee, Jong-Haw ; Chung, Gwiy-Sang

  • Author_Institution
    Sch. of Electr. Eng., Univ. of Ulsan, Ulsan
  • fYear
    2008
  • fDate
    23-29 June 2008
  • Firstpage
    198
  • Lastpage
    201
  • Abstract
    3C-SiC thin film is widely used extreme environment, RF and Bio-material in micro/nano electronic mechanical systems (M/NEMS). Mechanical properties of 3C-SiC thin films are required in the designing stage, because it is needed to accurately measuring Youngpsilas Modulus and hardness. The Youngpsilas Modulus and hardness is influenced by N-doping. In this paper, it was showed that the mechanical properties of polycrystalline (poly) 3C-SiC thin film was influenced by N-doping concentration, and 3C-SiC thin filmpsilas mechanical properties according to the N-doping concentration 1%, 3%, 5%, respectively was measured by Nano Indentation. In the case of 1% N-doping concentration, Youngldquos Modulus and Hardness were obtained as 270 GPa and 30 GPa, respectively. When the surface roughness according to N-doping concentrations was investigated by AFM (atomic force microscope), the roughness of 3C-SiC thin film doped by 5% concentration was 15 nm, which is also the best of them.
  • Keywords
    CVD coatings; Young´s modulus; atomic force microscopy; doping profiles; hardness; indentation; nitrogen; scanning electron microscopy; semiconductor doping; semiconductor growth; semiconductor thin films; silicon compounds; surface roughness; wide band gap semiconductors; 3C-SiC; LPCVD; RF material; SEM; SiC:N; Youngpsilas Modulus; atomic force microscope; biomaterial; hardness; in-situ doped polycrystalline thin films; nanoindentation; nitrogen doping concentration; surface roughness; thin film growth; Atomic force microscopy; Atomic measurements; Mechanical factors; Mechanical systems; Mechanical variables measurement; Nanoelectromechanical systems; Radio frequency; Rough surfaces; Surface roughness; Transistors; CVD; HMDS; poly 3C-SiC;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Strategic Technologies, 2008. IFOST 2008. Third International Forum on
  • Conference_Location
    Novosibirsk-Tomsk
  • Print_ISBN
    978-1-4244-2319-4
  • Electronic_ISBN
    978-1-4244-2320-0
  • Type

    conf

  • DOI
    10.1109/IFOST.2008.4602929
  • Filename
    4602929