• DocumentCode
    2632575
  • Title

    Equivalent lumped element models for various n-port Through Silicon Vias networks

  • Author

    Salah, Khaled ; Ragai, Hani ; Ismail, Yehea ; El Rouby, A.

  • Author_Institution
    Mentor Graphics, Cairo, Egypt
  • fYear
    2011
  • fDate
    25-28 Jan. 2011
  • Firstpage
    176
  • Lastpage
    183
  • Abstract
    This paper proposes an equivalent lumped element model for various multi-TSV arrangements and introduces closed form expressions for the capacitive, resistive, and inductive coupling between those arrangements. The closed form expressions are in terms of physical dimensions and material properties and are driven based on the dimensional analysis method. The model´s compactness and compatibility with SPICE simulators allows the electrical modeling of various TSV arrangements without the need for computationally expensive field-solvers and the fast investigation of a TSV impact on a 3-D circuit performance. The proposed model accuracy is tested versus a detailed electromagnetic simulation and showed less than 6% difference. Finally, the proposed model can be a possible solution to the industrial need for broadband electrical modeling of TSVs interconnections arising in 3-D integration. Also, our presented work provides valuable insight into creating guidelines for TSV macro-modeling.
  • Keywords
    SPICE; elemental semiconductors; integrated circuit modelling; silicon; 3D circuit; SPICE; TSV macro-modeling; capacitive coupling; electrical modeling; electromagnetic simulation; equivalent lumped element models; inductive coupling; resistive coupling; through silicon vias networks; various n-port; Capacitance; Couplings; Immune system; Integrated circuit modeling; Silicon; Substrates; Through-silicon vias; Dimensional Analysis; Modeling; TSV; Three-Dimensional ICs; Through Silicon Via;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design Automation Conference (ASP-DAC), 2011 16th Asia and South Pacific
  • Conference_Location
    Yokohama
  • ISSN
    2153-6961
  • Print_ISBN
    978-1-4244-7515-5
  • Type

    conf

  • DOI
    10.1109/ASPDAC.2011.5722180
  • Filename
    5722180