Oxide-coated polysilicon disk resonator gyroscope (DRG) within the wafer-scale encapsulation process

Author

Ahn, C.H. ; Ng, E. ; Hong, V.A. ; Huynh, J. ; Kenny, T.W. ; Wang, S.

Author_Institution

Mech. Eng. Dept., Stanford Univ., Stanford, CA, USA

fYear

2015

fDate

23-26 March 2015

Firstpage

1

Lastpage

2

Abstract

This paper reports fabrication and preliminary test results of oxide-coated polysilicon disk resonator gyroscopes (DRG) in a wafer-scale encapsulation. With this thin oxide coating, surface roughness of a fully encapsulated device was reduced by 10 × increasing the uniformity across the wafer. We also demonstrate the effects of oxide coating on key performance parameters of resonant-based sensors such as temperature coefficient of frequency (TCF) and quality factor (Q). Preliminary results show more than 30% increase in Q (75k) at 217 kHz resonant frequency.

Keywords

coating techniques; elemental semiconductors; encapsulation; gyroscopes; microfabrication; micromechanical resonators; microsensors; silicon; surface roughness; DRG fabrication; Si; frequency 217 kHz; oxide coated polysilicon disk resonator gyroscope; quality factor; resonant based sensors; surface roughness; temperature coefficient of frequency; wafer scale encapsulation process; Coatings; Fabrication; Gyroscopes; Q-factor; Rough surfaces; Surface roughness; Surface treatment; Disk Resonator Gyroscope; MEMS; Oxide-coating; Polysilicon; Surface roughness;

fLanguage

English

Publisher

ieee

Conference_Titel

Inertial Sensors and Systems (ISISS), 2015 IEEE International Symposium on

Conference_Location

Hapuna Beach, HI

Type

conf

DOI

10.1109/ISISS.2015.7102392

Filename

7102392