Multipactor discharge in a dielectricloaded accelerating structure

Summary form only given. Based on the previous observation of multipactor discharge during high-power testing of an alumina-based dielectric loaded accelerating (DLA) structure, where strong normal and tangential RF electric fields are present, and RF power flow is parallel to the surface, we extend the model of multipactor discharge (on a simple RF window) to describe the electron multiplication and its power deposited in the DLA structure. Using Monte Carlo simulation with random distributions in the emission velocities and emission angles of the secondary electron, taking realistic secondary electron yield curves as input, our dynamic calculation takes into account the evolution of DC electric field and beam loading of the external RF electric field. It is found that the fraction of power absorbed by multipactor at saturation is much larger than the case for a simple RF window and it is sensitive to the incident power, which confirms the prior experimental observation