• DocumentCode
    2654357
  • Title

    Etch Resistance Of Focused-ion-beam-implanted SiO2

  • Author

    Geil, Bruce ; Merritt, Scott ; Simonis, George ; Dagenais, Mario

  • Author_Institution
    Harry Diamond Laboratories
  • fYear
    1991
  • fDate
    29 Jul-2 Aug 1991
  • Firstpage
    66
  • Lastpage
    67
  • Keywords
    Etching; Hafnium; Ion beams; Lithography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, 1991/Microfabrication for Photonics and Optoelectronics, 1991. LEOS 1991 Summer Topical Meetings on
  • Print_ISBN
    0-87942-618-7
  • Type

    conf

  • DOI
    10.1109/LEOSST.1991.639022
  • Filename
    639022
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2654357