DocumentCode

2661122

Title

Dense Plasma Focus X-ray Source For Lithography

Author

Prasad, R. Raghu ; Krishnan, Mohan ; Mangano, J. ; Burkhalter, P. ; Maldonado, Jefferson

Author_Institution

SRL

fYear

1993

fDate

1-3 June 1993

Firstpage

145

Lastpage

145

Keywords

Capacitors; Condition monitoring; Fault location; Inductance; Insulation; Lithography; Plasma density; Plasma devices; Plasma sources; Plasma x-ray sources;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science,1992. IEEE Conference Record - Abstracts., 1992 IEEE International Conference on

Conference_Location

Tampa, FL, USA

Print_ISBN

0-7803-0716-X

Type

conf

DOI

10.1109/PLASMA.1992.697919

Filename

697919