• DocumentCode
    2662133
  • Title

    850 nm Germanium Photodetector Performance

  • Author

    Morse, M. ; Dosunmu, F. ; Ginsburg, E. ; Chetrit, Y. ; Sarid, G.

  • fYear
    2006
  • fDate
    13-15 Sept. 2006
  • Firstpage
    170
  • Lastpage
    172
  • Abstract
    Photodetectors made from silicon-germanium have been pursued for the past two decades as a way to bring near infrared detection capability into a low-cost silicon process. The raw performance of Ge on Si detectors at 850 nm has been found to be close to that of GaAs devices in optical properties, and the leakage current for these relatively large devices is nearing that needed for many applications. Further receiver data shows that the Ge detectors are comparable to commercial receivers based on GaAs detectors at 4 Gb/s with a sensitivity lower than -18 dBm and jitter performance less than 40 ps
  • Keywords
    Ge-Si alloys; infrared detectors; leakage currents; photodetectors; 850 nm; SiGe; detector sensitivity; germanium photodetector performance; jitter performance; leakage current; low-cost silicon process; near infrared detection capability; optical properties; silicon detectors; Gallium arsenide; Germanium silicon alloys; Infrared detectors; Leak detection; Leakage current; Optical devices; Optical receivers; Optical sensors; Photodetectors; Silicon germanium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Group IV Photonics, 2006. 3rd IEEE International Conference on
  • Conference_Location
    Ottawa, Ont.
  • Print_ISBN
    1-4244-0096-1
  • Type

    conf

  • DOI
    10.1109/GROUP4.2006.1708202
  • Filename
    1708202