DocumentCode
2662133
Title
850 nm Germanium Photodetector Performance
Author
Morse, M. ; Dosunmu, F. ; Ginsburg, E. ; Chetrit, Y. ; Sarid, G.
fYear
2006
fDate
13-15 Sept. 2006
Firstpage
170
Lastpage
172
Abstract
Photodetectors made from silicon-germanium have been pursued for the past two decades as a way to bring near infrared detection capability into a low-cost silicon process. The raw performance of Ge on Si detectors at 850 nm has been found to be close to that of GaAs devices in optical properties, and the leakage current for these relatively large devices is nearing that needed for many applications. Further receiver data shows that the Ge detectors are comparable to commercial receivers based on GaAs detectors at 4 Gb/s with a sensitivity lower than -18 dBm and jitter performance less than 40 ps
Keywords
Ge-Si alloys; infrared detectors; leakage currents; photodetectors; 850 nm; SiGe; detector sensitivity; germanium photodetector performance; jitter performance; leakage current; low-cost silicon process; near infrared detection capability; optical properties; silicon detectors; Gallium arsenide; Germanium silicon alloys; Infrared detectors; Leak detection; Leakage current; Optical devices; Optical receivers; Optical sensors; Photodetectors; Silicon germanium;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics, 2006. 3rd IEEE International Conference on
Conference_Location
Ottawa, Ont.
Print_ISBN
1-4244-0096-1
Type
conf
DOI
10.1109/GROUP4.2006.1708202
Filename
1708202
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