Outgassing of quartz

Author

Pierce, D.E. ; Murray, R.A. ; Lareau, R. ; Laffey, S. ; Vig, J.R.

Author_Institution

US Army Res. Lab., Fort Monmouth, NJ, USA

fYear

1994

fDate

1-3 Jun 1994

Firstpage

107

Lastpage

114

Abstract

The outgassing of quartz crystal plates was measured with a high resolution mass spectrometer using thermal desorption techniques. As the quartz was heated from 40°C to 1200°C in a vacuum, the mass spectrometer identified several types of gases. The primary species that appeared were NH₃, OH, and H₂O. The bonding sites of the OH and H₂O are discussed, including the temperature dependence of the desorption peaks which is used to calculate the activation energies of the surface states. Bakeout times and temperatures to insure clean surfaces are calculated. The effect of bakeout conditions on aging is also discussed. The presence of NH₃ was unexpected, but it is believed that the NH₃ was due to the sample preparation which included etching the samples in ammonium bifluoride

Keywords

ammonia; crystal resonators; desorption; hydrogen compounds; mass spectroscopic chemical analysis; mass spectroscopy; surface states; H₂O; NH₃; OH; activation energies; aging; ammonium bifluoride; bakeout times; bonding sites; clean surfaces; desorption peaks; etching; high resolution mass spectrometer; laser heating; outgassing; quartz crystal plates; sample preparation; surface states; temperature dependence; thermal desorption; Aging; Crystals; Electrodes; Heating; Hydrogen; Impurities; Mass spectroscopy; Punching; Surface cleaning; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

Frequency Control Symposium, 1994. 48th., Proceedings of the 1994 IEEE International

Conference_Location

Boston, MA

Print_ISBN

0-7803-1945-1

Type

conf

DOI

10.1109/FREQ.1994.398348

Filename

398348