• DocumentCode
    2669420
  • Title

    Modeling Diamond Deposition In Microwave Assisted CVD Reactors

  • Author

    Hyman, Emily ; Tsang, K. ; Drobot, Adam ; Lane, Brett

  • Author_Institution
    Science Applications International Corporation
  • fYear
    1993
  • fDate
    1-3 June 1993
  • Firstpage
    170
  • Lastpage
    170
  • Keywords
    Chemical vapor deposition; Contracts; Electromagnetic heating; Electrons; Inductors; Microwave circuits; Microwave generation; Plasma applications; Plasma chemistry; Plasma density;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science,1992. IEEE Conference Record - Abstracts., 1992 IEEE International Conference on
  • Conference_Location
    Tampa, FL, USA
  • Print_ISBN
    0-7803-0716-X
  • Type

    conf

  • DOI
    10.1109/PLASMA.1992.697985
  • Filename
    697985
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2669420