DocumentCode
2671187
Title
Modeling Inductively Coupled Discharges For Plasma Processing
Author
Mark J.Kushner ; Timothy J.Sommerer ; Seung J.Choi
Author_Institution
University of Illinois
fYear
1993
fDate
1-3 June 1993
Firstpage
178
Lastpage
178
Keywords
Argon; Chemicals; Electrons; Inductors; Kinetic theory; Magnets; Monte Carlo methods; Plasma materials processing; Plasma temperature; Semiconductor device modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science,1992. IEEE Conference Record - Abstracts., 1992 IEEE International Conference on
Conference_Location
Tampa, FL, USA
Print_ISBN
0-7803-0716-X
Type
conf
DOI
10.1109/PLASMA.1992.698003
Filename
698003
Link To Document