• DocumentCode
    2678241
  • Title

    A microfabricated icp source and its application in miniaturization of spectrometer

  • Author

    Pu, Yongni ; Yin, Chao

  • Author_Institution
    Dept. of Electron. & Inf. Eng., Langfang Teacher´´s Coll., Langfang, China
  • Volume
    5
  • fYear
    2010
  • fDate
    27-29 March 2010
  • Firstpage
    336
  • Lastpage
    338
  • Abstract
    A novel microfabricated inductively coupled plasma (ICP) source is introduced, which is an atomic emission spectrum excitation source. Its radio frequency power loss, size and Argon consumption are far less than one percent of atmospheric pressure ICP source. The micro ICP source is based on MEMS technology, its working gas is Argon at 100Pa. The configuration and characteristics of the micro ICP source are described. The application of the source in spectrometers is illustrated, it is intended to be used in conjunction with a planar miniature Fabry-Perot spectrometer to form a micro gas analyzer. A micro ICP source developed by author is introduced briefly, which work at 13.56MHz. At last, with the development of MEMS technology, the potential application areas of micro gas analyzer is presented.
  • Keywords
    argon; atmospheric pressure; interference spectrometers; microfabrication; microsensors; radiofrequency spectrometers; MEMS technology; argon consumption; atmospheric pressure ICP source; atomic emission spectrum excitation source; frequency 13.56 MHz; microfabricated ICP source; microfabricated inductively coupled plasma source; microgas analyzer; planar miniature Fabry-Perot spectrometer; radio frequency power loss; spectrometer miniaturization; Argon; Coils; Equivalent circuits; Inductance; Micromechanical devices; Plasma properties; Plasma sources; Radio frequency; Spectroscopy; Spirals; MEMS; micro gas analyzer; microfabricated ICP source; miniature Fabry-Perot spectrometer;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Computer Control (ICACC), 2010 2nd International Conference on
  • Conference_Location
    Shenyang
  • Print_ISBN
    978-1-4244-5845-5
  • Type

    conf

  • DOI
    10.1109/ICACC.2010.5487065
  • Filename
    5487065