DocumentCode
267899
Title
An optical in-plane displacement measurement technique with sub-nanometer accuracy based on curve-fitting
Author
Kokorian, Jaap ; Buja, Federico ; Staufer, Urs ; van Spengen, W. Merlijn
Author_Institution
Delft Univ. of Technol., Delft, Netherlands
fYear
2014
fDate
26-30 Jan. 2014
Firstpage
580
Lastpage
583
Abstract
In this paper we present a new optical method for detecting in-plane displacements in microelectromechanical systems with deep sub-nanometer accuracy. The technique is based on curve fitting. We investigate the error sources that influence the measurement and show measurements to demonstrate that a position resolution of 130 pm can be obtained with a simple microscope and camera.
Keywords
CMOS image sensors; cameras; curve fitting; displacement measurement; micromechanical devices; optical microscopy; camera; curve fitting; error sources; microelectromechanical systems; optical in-plane displacement measurement; position resolution; simple microscope; subnanometer accuracy; Acoustic beams; Displacement measurement; Micromechanical devices; Noise; Noise measurement; Position measurement; Voltage measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems (MEMS), 2014 IEEE 27th International Conference on
Conference_Location
San Francisco, CA
Type
conf
DOI
10.1109/MEMSYS.2014.6765707
Filename
6765707
Link To Document