• DocumentCode
    2679920
  • Title

    Copper CVD precursors and processes for advanced metallization

  • Author

    Doppelt, P.

  • Author_Institution
    ESPCI-CNRS, Laboratoire de Chimie Inorganique
  • fYear
    1997
  • fDate
    16-19 March 1997
  • Firstpage
    23
  • Lastpage
    24
  • Keywords
    Chemical reactors; Chemical vapor deposition; Copper; Design optimization; Equations; Inorganic materials; Integrated circuit interconnections; Integrated circuit metallization; Liquids; Termination of employment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
  • Conference_Location
    Villard de Lans, France
  • ISSN
    1266-0167
  • Type

    conf

  • DOI
    10.1109/MAM.1998.887498
  • Filename
    887498
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2679920