DocumentCode
2680851
Title
Investigation of chemical interactions on the interface W/Si
Author
Pluscheva, S.V. ; Shabeinikov, L.G. ; Malikov, I.V. ; Andreeva, A.V.
Author_Institution
Russian Academy of Sciences
fYear
1997
fDate
16-19 March 1997
Firstpage
178
Lastpage
179
Keywords
Annealing; Chemical vapor deposition; Hydrogen; Materials science and technology; Plasma measurements; Plasma temperature; Plasma x-ray sources; Semiconductor films; Silicides; Sputtering;
fLanguage
English
Publisher
ieee
Conference_Titel
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location
Villard de Lans, France
ISSN
1266-0167
Type
conf
DOI
10.1109/MAM.1998.887564
Filename
887564
Link To Document