DocumentCode
2681000
Title
Patterning of silicide layers by local oxidation
Author
Klinkhammer, F. ; Dolle, M. ; Mantl, S.
Author_Institution
Institut fur Schicht- und lonentechnik
fYear
1997
fDate
16-19 March 1997
Firstpage
199
Lastpage
200
Keywords
Atomic layer deposition; Molecular beam epitaxial growth; Oxidation; Protection; Scanning electron microscopy; Semiconductor process modeling; Silicides; Silicon; Stress; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location
Villard de Lans, France
ISSN
1266-0167
Type
conf
DOI
10.1109/MAM.1998.887574
Filename
887574
Link To Document