• DocumentCode
    2682324
  • Title

    Processing technology of embedded thin-film resistor materials

  • Author

    Lai, Lifei ; Sun, Rong ; Zhao, Tao ; Zeng, XiaoLiang ; Yu, ShuHui

  • fYear
    2011
  • fDate
    25-28 Oct. 2011
  • Firstpage
    60
  • Lastpage
    65
  • Abstract
    It is relatively rare for us to research Embedded Thin-Film Resistor (ETFR) Materials in domestic. This paper describes the development history and present situation of the ETFR, the whole process technology is told, the urgency of domestic products is revealed, the thermal stability and microscopic characteristics of the Ni-Cr (80/20 wt.%) ETFR material that we have researched are introduced, the possible development and application is also tentatively discussed.
  • Keywords
    chromium; nickel; thermal stability; thin film resistors; ETFR material; Ni-Cr; embedded thin-film resistor material; microscopic characteristic; processing technology; thermal stability; Films; Metals; Resistance; Resistors; Sputtering; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Packaging Materials (APM), 2011 International Symposium on
  • Conference_Location
    Xiamen
  • ISSN
    1550-5723
  • Print_ISBN
    978-1-4673-0148-0
  • Type

    conf

  • DOI
    10.1109/ISAPM.2011.6105671
  • Filename
    6105671